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au.\*:("KOBAYASHI, Katsutoshi")

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Numerical simulation of unsteady turbulent flow by voxel methodKOBAYASHI, Katsutoshi; SHIMIZU, Hayato; KAIHO, Masayuki et al.JSME international journal. Series B, fluids and thermal engineering. 2004, Vol 47, Num 3, pp 477-482, issn 1340-8054, 6 p.Article

Nanopatterning of diblock copolymer directed self-assembly lithography with wet developmentMURAMATSU, Makoto; IWASHITA, Mitsuaki; KITANO, Takahiro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7970, issn 0277-786X, isbn 978-0-8194-8529-8, 79701F.1-79701F.7Conference Paper

Frequent Splicing Aberration of the Base Excision Repair Gene hMYH in Human Gastric CancerKOBAYASHI, Katsutoshi; SHIDA, Atsuo; YAMADA, Hisashi et al.Anticancer research. 2008, Vol 28, Num 1A, pp 215-221, issn 0250-7005, 7 p.Article

Sub-45nm Resist Process Using Stacked-Mask ProcessSEINO, Yuriko; KOBAYASHI, Katsutoshi; ITO, Shinichi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69232O.1-69232O.8, issn 0277-786X, isbn 978-0-8194-7108-6Conference Paper

Prognostic significance of vascular endothelial growth factor D in gastric carcinomaSHIDA, Atsuo; FUJIOKA, Shuichi; ISHIBASHI, Yoshio et al.World journal of surgery. 2005, Vol 29, Num 12, pp 1600-1607, issn 0364-2313, 8 p.Article

XPC lymphoblastoid cells defective in the hMutSα DNA mismatch repair complex exhibit normal sensitivity to UVC radiation and normal transcription-coupled excision repair of DNA cyclobutane pyrimidine dimersKOBAYASHI, Katsutoshi; O'DRISCOLL, Mark; MACPHERSON, Peter et al.DNA repair. 2004, Vol 3, Num 6, pp 649-657, issn 1568-7864, 9 p.Article

Methylxanthine sensitization of human colon cancer cells to 186Re-labeled monoclonal antibodyKINUYA, Seigo; YOKOYAMA, Kunihiko; KUDO, Miho et al.The Journal of nuclear medicine (1978). 2001, Vol 42, Num 4, pp 596-600, issn 0161-5505Article

Sub-30 nm via interconnects fabricated using directed self-assembly : Nanolithography 2012KATO, Hirokazu; SEINO, Yuriko; AZUMA, Tsukasa et al.Microelectronic engineering. 2013, Vol 110, pp 152-155, issn 0167-9317, 4 p.Conference Paper

The Resist-core Spacer Patterning Process for Fabrication of 2xnm Node Semiconductor DevicesSHO, Koutarou; OORI, Tomoya; IIDA, Kazunori et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7972, issn 0277-786X, isbn 978-0-8194-8531-1, 79720C.1-79720C.11, 2Conference Paper

Feasibility study of non-topcoat resist for 22nm node devicesSHO, Koutaro; KATO, Hirokazu; NISHIMURA, Yukio et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7273, issn 0277-786X, isbn 978-0-8194-7526-8 0-8194-7526-2, 72733B.1-72733B.8, 2Conference Paper

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